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| A Look At Future Intel Technology |
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The Prescott Core 1MB L2 cache! -The Prescott will be the first desktop CPU to feature a whopping 1MB L2 cache. This very large L2 cache size will boost performance and help Intel stay competitive.
90nm process - The 90nm process is the next generation after the 0.13- micron process and will allow this CPU to be produced cheaper and ramp to higher clock speeds.
Seven layers of high-speed copper interconnects - The current Intel 0.13-micron CPU’s have 6 layers of copper interconnects. The 90nm process will feature a seventh metal layer and will allow for many more transistors-100M+.
1.2nm gate oxide thickness - (Very thin, thinnest ever)
50nm gate lengths - The 0.13 micron CPU’s have gate lengths of 70nm, Intel is just shrinking them down to 50nm which is very freaking small.
New low-k dielectric material - Beyond my knowledge.
Lower voltages - The 90nm transistors will run at around 1.20V! The core voltage of the Prescott will mainly depend on the clock frequency but most likely will be lower than the current standard (1.525V).
Strained silicon technology - A transistor is basically a switch that turn’s on and off. When a transistor is on it must pass current and when it is off it must stop current. Basically what Intel is doing is stretching the silicon to improve flow of electrons and reducing resistance. This technology will improve current flow by 10-20%
Hyper-Threading
Bus Speed - I have heard rumors of an 800 MHz bus (200 quad pumped) but I am unable to verify this.
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